TY - JOUR
T1 - Wafer-Scale 1T′ MoTe2 for Fast Response Self-Powered Wide-Range Photodetectors
AU - Mao, Jiatong
AU - Zhang, Youqi
AU - Zhang, Yinuo
AU - Lin, Yunan
AU - Feng, Yao
AU - Hu, Yongqi
AU - Shafa, Muhammad
AU - Pan, Yi
N1 - Publisher Copyright:
© 2023 American Chemical Society.
PY - 2023/6/14
Y1 - 2023/6/14
N2 - The semimetal-based photodetector possesses the intrinsic advantage of high response speed, low power consumption, and wide-range photoresponse. Here, we report the synthesis and application of 1 inch wafer-scale polycrystalline few layer 1T′-MoTe2 on the SiO2/Si substrate by employing a modified chemical vapor deposition method of predeposition of precursors. A continuous film with seamlessly stitched micrometer scale grains has been realized, and the pure 1T′ phase was confirmed by Raman spectroscopy. An asymmetric metal electrode photodetector device of Pd-MoTe2-Au was designed and fabricated by using shadow mask-assisted UHV deposition. By measuring the self-powered photocurrent under the illumination of Xe lamp, we show that the device is sensitive to a wide spectra range (λ = 320-1200 nm) while maintaining high performance of the ON/OFF ratio (∼103), responsivity (1.2 A/W), and specific detectivity (7.68 × 1012 Jones). Under 450, 648, and 850 nm pulsed laser illumination, the response time achieves tens of microsecond scale. The device shows polarized photoresponse as well.
AB - The semimetal-based photodetector possesses the intrinsic advantage of high response speed, low power consumption, and wide-range photoresponse. Here, we report the synthesis and application of 1 inch wafer-scale polycrystalline few layer 1T′-MoTe2 on the SiO2/Si substrate by employing a modified chemical vapor deposition method of predeposition of precursors. A continuous film with seamlessly stitched micrometer scale grains has been realized, and the pure 1T′ phase was confirmed by Raman spectroscopy. An asymmetric metal electrode photodetector device of Pd-MoTe2-Au was designed and fabricated by using shadow mask-assisted UHV deposition. By measuring the self-powered photocurrent under the illumination of Xe lamp, we show that the device is sensitive to a wide spectra range (λ = 320-1200 nm) while maintaining high performance of the ON/OFF ratio (∼103), responsivity (1.2 A/W), and specific detectivity (7.68 × 1012 Jones). Under 450, 648, and 850 nm pulsed laser illumination, the response time achieves tens of microsecond scale. The device shows polarized photoresponse as well.
KW - 1T′ MoTe
KW - chemical vapor deposition
KW - self-powered
KW - topological semimetal
KW - wide-range photodetector
UR - https://www.scopus.com/pages/publications/85162854627
U2 - 10.1021/acsami.3c05902
DO - 10.1021/acsami.3c05902
M3 - 文章
C2 - 37264530
AN - SCOPUS:85162854627
SN - 1944-8244
VL - 15
SP - 28267
EP - 28276
JO - ACS Applied Materials and Interfaces
JF - ACS Applied Materials and Interfaces
IS - 23
ER -