摘要
A normally-off field effect transistor with 15 nm LaB6 gate material directly deposited on hydrogen-terminated diamond surface has been fabricated and characterized. The reason for the normally-off operation could be attributed to the low work function of LaB6 layer, which can deplete holes in the channel. Due to the formation of C-B bond of interface and the thin thickness of LaB6, the subthreshold swing is as low as 70.6 mV/dec and interface state density is as low as 2 × 1011 cm−2eV−1. The maximum drain current density (IDSmax), extrinsic transconductance (Gm), threshold voltage (VTH), and on/off ratio for the device with 8-μm gate length are −60 mA/mm, 5 mS/mm, −1.1 V, and 109, respectively. The low-field mobility (μ0) without vertical-field degradation is 187 cm2/V s. The trapped charge density and fixed charge density are 8.75 × 1011 and 1.26 × 1012 cm−2, respectively. The LaB6/H-diamond logic inverters coupling with different load resistors show distinct inversion characteristics with a peak gain of 4.7 V/V.
| 源语言 | 英语 |
|---|---|
| 期刊论文编号 | 263501 |
| 期刊 | Applied Physics Letters |
| 卷 | 125 |
| 期 | 26 |
| DOI | |
| 出版状态 | 已出版 - 23 12月 2024 |
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