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Unveiling the mechanism of selective dissolution-repassivation for effective oxide film removal from alloy 690 in alkaline H2O2 solutions

  • Yanhui Li
  • , Pengfei Gao
  • , Zhouyang Bai
  • , Wang Zhu
  • , Shaoming Ding
  • , Yinan Zhang
  • , Qibo Wang
  • University of California at Berkeley
  • Xi'an Jiaotong University
  • South China University of Technology

科研成果: 期刊稿件文章同行评审

摘要

This study investigates the corrosion behavior and oxide film removal of Alloy 690 in a boron-free Small Modular Reactor (SMR) environment, which focuses on the electrochemical and structural mechanisms of oxide film formation and selective removal under different conditions. Using hydrogen peroxide (H2O2) as a green oxidant, this study evaluates the effectiveness of various oxide removal schemes, including acidic, lithium-removal, and alkaline H2O2-based treatments. The results show that the without lithium-removal scheme under alkaline conditions (pH = 9.5) achieves the most efficient oxide removal, selectively dissolving Cr oxides while preserving the Ni-based substrate. This process leads to the formation of a new, non-radioactive, protective oxide film, ensuring substrate integrity. Electrochemical analyses reveal that the selective dissolution of Cr and the rapid repassivation of the alloy surface contribute to enhanced corrosion resistance after treatment. These findings introduce a novel electrochemical dissolution-induced repassivation mechanism for oxide removal, providing a material-friendly alternative to traditional decontamination methods in SMRs. The study offers valuable insights for optimizing decontamination strategies in boron-free reactor environments, contributing to the safety and sustainability of next-generation nuclear reactors.

源语言英语
期刊论文编号177706
期刊Chemical Engineering Journal
541
DOI
出版状态已出版 - 1 8月 2026

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