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Uniform design method of the exposure time of X-ray picoseconds framing camera with gated microchannel plate

  • Wen Zheng Yang
  • , Xun Hou
  • , Yong Lin Bai
  • , Xiao Hong Bai
  • , Jin Shou Tian
  • , Bai Yu Liu
  • , Jun Ping Zhao
  • , Jun Jun Qin
  • , Xian Ouyang
  • CAS - Xi'an Institute of Optics and Precision Mechanics

科研成果: 期刊稿件文章同行评审

7 引用 (Scopus)

摘要

The Uniform Design method is applied for the research of the X-ray Picoseconds Framing Camera with gated MCP (micro-channel plate), shortened form MCP-XPFC. On the bases of the theoretical models of picoseconds (ps) voltage pulse gated MCP-XPFC (L = 0.5 mm, L/D = 40), the fast forecast model of exposure time of MCP-XPFC is put forward. It can accurately replace the theoretical models within the range of experimental parameter and highly enhance the work efficiency. The curves of exposure time versus the width and amplitude of picoseconds high voltage pulse respectively are all the parabola type and there are the interaction on exposure time induced by the width and amplitude of gated pulse. The forecast model is checked by using two groups gated experimental pulses and the error is analyzed at last of this paper.

源语言英语
页(从-至)439-443
页数5
期刊Guangzi Xuebao/Acta Photonica Sinica
37
3
出版状态已出版 - 3月 2008

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