摘要
We present a planar, dopant-segregation-free SnO2 nanofilm varistor on a polycrystalline Al2O3 substrate that achieves a kilovolt-level breakdown voltage (V1 mA ≈ 759 V at 300 K). By directing the conduction pathway laterally across approximately 200 grain boundaries in series, this architecture overcomes the low-voltage limitations of conventional vertical thin films. Within the compliance-limited window, the device exhibits a pronounced divergent nonlinearity without bulk-resistance rollover. This steep current rise is analytically identified as an avalanche-type divergence, α (V) = V / (V* − V), driven by an electro-thermally assisted barrier collapse under localized Joule heating. To capture the full I–V trajectory across 200–500 K, we formulate a cascade model employing logistic soft-switch weights to govern the competitive transitions among Ohmic leakage, thermionic emission, and avalanche multiplication. The critical divergence voltage V* follows a strict Arrhenius scaling with an effective activation energy of ∼33 meV, reflecting how ambient thermal energy exponentially accelerates the pre-breakdown conductivity to reach the thermal runaway threshold. This planar nanofilm provides a lithographically defined, circuit-compatible platform, complementary to bulk ceramics, for on-chip transient voltage suppression.
| 源语言 | 英语 |
|---|---|
| 期刊论文编号 | 053506 |
| 期刊 | Applied Physics Letters |
| 卷 | 129 |
| 期 | 5 |
| DOI | |
| 出版状态 | 已出版 - 3 8月 2026 |
学术指纹
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