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Thermal management strategies for gallium oxide vertical trench-fin MOSFETs

  • Robert H. Montgomery
  • , Yuewei Zhang
  • , Chao Yuan
  • , Samuel Kim
  • , Jingjing Shi
  • , Takeki Itoh
  • , Akhil Mauze
  • , Satish Kumar
  • , James Speck
  • , Samuel Graham
  • Georgia Institute of Technology
  • University of California at Santa Barbara

科研成果: 期刊稿件文章同行评审

38 引用 (Scopus)

摘要

Trench-fin MOSFETs, with their near-surface heat generation and the higher-surface area afforded by their geometry for thermal management, represent a promising solution to the thermal problems frequently encountered in lateral β-Ga2O3 devices. Here, we investigate potential thermal-management strategies for a vertical β-Ga2O3 trench-fin MOSFET through parametric analysis, offering recommendations on how best to design a device for maximal current density and excellent thermal performance. Primarily, by using a thermally conductive dielectric over the MOSFET structure, significant improvements to device power density may be achieved, aided by thermal spreading. Additionally, we find that by bonding thermal spreaders to its topside can yield significant improvements in thermal performance.

源语言英语
文章编号085301
期刊Journal of Applied Physics
129
8
DOI
出版状态已出版 - 28 2月 2021

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