TY - JOUR
T1 - Thermal management strategies for gallium oxide vertical trench-fin MOSFETs
AU - Montgomery, Robert H.
AU - Zhang, Yuewei
AU - Yuan, Chao
AU - Kim, Samuel
AU - Shi, Jingjing
AU - Itoh, Takeki
AU - Mauze, Akhil
AU - Kumar, Satish
AU - Speck, James
AU - Graham, Samuel
N1 - Publisher Copyright:
© 2021 Author(s).
PY - 2021/2/28
Y1 - 2021/2/28
N2 - Trench-fin MOSFETs, with their near-surface heat generation and the higher-surface area afforded by their geometry for thermal management, represent a promising solution to the thermal problems frequently encountered in lateral β-Ga2O3 devices. Here, we investigate potential thermal-management strategies for a vertical β-Ga2O3 trench-fin MOSFET through parametric analysis, offering recommendations on how best to design a device for maximal current density and excellent thermal performance. Primarily, by using a thermally conductive dielectric over the MOSFET structure, significant improvements to device power density may be achieved, aided by thermal spreading. Additionally, we find that by bonding thermal spreaders to its topside can yield significant improvements in thermal performance.
AB - Trench-fin MOSFETs, with their near-surface heat generation and the higher-surface area afforded by their geometry for thermal management, represent a promising solution to the thermal problems frequently encountered in lateral β-Ga2O3 devices. Here, we investigate potential thermal-management strategies for a vertical β-Ga2O3 trench-fin MOSFET through parametric analysis, offering recommendations on how best to design a device for maximal current density and excellent thermal performance. Primarily, by using a thermally conductive dielectric over the MOSFET structure, significant improvements to device power density may be achieved, aided by thermal spreading. Additionally, we find that by bonding thermal spreaders to its topside can yield significant improvements in thermal performance.
UR - https://www.scopus.com/pages/publications/85101534926
U2 - 10.1063/5.0033001
DO - 10.1063/5.0033001
M3 - 文章
AN - SCOPUS:85101534926
SN - 0021-8979
VL - 129
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 8
M1 - 085301
ER -