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The plasma in high-current pseudospark switches

  • A. Görtler
  • , K. Frank
  • , S. Insam
  • , U. Prucker
  • , A. Schwandner
  • , R. Tkotz
  • , J. Christiansen
  • , D. H.H. Hoffmann
  • Friedrich-Alexander University Erlangen-Nürnberg

科研成果: 期刊稿件文章同行评审

4 引用 (Scopus)

摘要

The discharge behavior and the erosion rate of pseudospark switches for high currents (50-150 kA) and pulse lengths of several microseconds were investigated for different electrode materials. A capacitor discharge (3.3 μF) without any load was used at a maximum voltage of 30 kV. Side-on optical investigations were performed either with a streak camera or a fast shutter camera. Using metal electrodes, the discharge ignites on axis, then widens up radially and burns homogeneously at the edge of the central apertures. After about 500 ns, a stable anode spot is observed on the plane electrode surface (at currents exceeding 45 kA), the location of which is statistical. The discharge is transformed to a metal vapor arc discharge and the erosion rate increases by more than one order of magnitude. With semiconductor electrodes (i.e., silicon carbide), a different discharge behavior is observed. After ignition on axis, the discharge burns homogeneously on the whole carbide surface. No contraction to a small area occurs in comparison to metal electrodes. The reignition of later current half cycles starts at the triple point metal-carbide-gas. Then the discharge again spreads homogeneously over the total carbide surface. The erosion rate is about two magnitudes lower in comparison to metals. We assume that the current is conducted in a thin surface sheath which is heated to more than 2000 K.

源语言英语
页(从-至)51-52
页数2
期刊IEEE Transactions on Plasma Science
24
1
DOI
出版状态已出版 - 1996
已对外发布

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