跳到主要导航 跳到搜索 跳到主要内容

The effects of xenon implantation in ceria with and without lanthanum

  • B. Ye
  • , D. Yun
  • , A. J. Oaks
  • , W. Chen
  • , M. A. Kirk
  • , J. Rest
  • , A. M. Yacout
  • , J. F. Stubbins
  • University of Illinois at Urbana-Champaign
  • Argonne National Laboratory

科研成果: 期刊稿件文章同行评审

7 引用 (Scopus)

摘要

A combination of in situ and ex situ transmission electron microscopy (TEM) experiments was used to study the evolution of defect clusters during implantation of Xe at the energy of 700 keV. Xenon has been implanted into CeO 2 and Ce/LaO 2 single crystal thin films up to doses of 1 × 10 17 ions/cm 2 at room temperature and 600 °C. The evolution of microstructure, especially the formation of solid-state precipitates, during irradiation is found to be a function of material composition, irradiation dose and irradiation temperature. The precipitates are either aggregated Xe in the solid state or metallic Ce due to the active redox reaction in CeO 2 and Ce/LaO 2. Further investigations with the help of X-ray techniques will be carried out in the future.

源语言英语
页(从-至)236-238
页数3
期刊Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
272
DOI
出版状态已出版 - 1 2月 2012
已对外发布

学术指纹

探究 'The effects of xenon implantation in ceria with and without lanthanum' 的科研主题。它们共同构成独一无二的学术指纹。

引用此