TY - JOUR
T1 - The effect of ethanol gas impurity on the discharge mode and discharge products of argon plasma jet at atmospheric pressure
AU - Xia, Wenjie
AU - Liu, Dingxin
AU - Xu, Han
AU - Wang, Xiaohua
AU - Liu, Zhijie
AU - Rong, Mingzhe
AU - Kong, Michael G.
N1 - Publisher Copyright:
© 2018 IOP Publishing Ltd.
PY - 2018/5/3
Y1 - 2018/5/3
N2 - Argon is a widely used working gas of plasmas, which is much cheaper than helium but on the other hand much more difficult to generate diffuse discharge at atmospheric pressure. In order to meet the application requirements, plenty of researches have been reported to facilitate the diffuse discharge happening for argon plasmas, and in this paper an approach of using ethanol gas (EtOH) impurity is investigated. The discharge characteristics of Ar + EtOH plasma jet are studied as a function of the applied voltage and the concentration of EtOH, from which the concentration of EtOH between ∼200 and ∼3300 parts per million (ppm) is determined necessary for the generation of diffuse discharge. Compared with the helium plasma jet in literature, it is deduced that the diffuse discharge is probably caused by the Penning ionization happening between the metastable argon and EtOH. The discharge products of Ar + EtOH (672 ppm) plasma jet are measured and the corresponding chemistry pathways are analyzed. About 20% of EtOH is decomposed via complex chemical reactions to form more than a dozen of neutral species, such as CH3CHO, CH3COOH, CO, H2O, and C n H2n+2 (n ≥ 3), and various kinds of ionic species, including C+, CH+, ArH+, CH3CH2O-, etc.
AB - Argon is a widely used working gas of plasmas, which is much cheaper than helium but on the other hand much more difficult to generate diffuse discharge at atmospheric pressure. In order to meet the application requirements, plenty of researches have been reported to facilitate the diffuse discharge happening for argon plasmas, and in this paper an approach of using ethanol gas (EtOH) impurity is investigated. The discharge characteristics of Ar + EtOH plasma jet are studied as a function of the applied voltage and the concentration of EtOH, from which the concentration of EtOH between ∼200 and ∼3300 parts per million (ppm) is determined necessary for the generation of diffuse discharge. Compared with the helium plasma jet in literature, it is deduced that the diffuse discharge is probably caused by the Penning ionization happening between the metastable argon and EtOH. The discharge products of Ar + EtOH (672 ppm) plasma jet are measured and the corresponding chemistry pathways are analyzed. About 20% of EtOH is decomposed via complex chemical reactions to form more than a dozen of neutral species, such as CH3CHO, CH3COOH, CO, H2O, and C n H2n+2 (n ≥ 3), and various kinds of ionic species, including C+, CH+, ArH+, CH3CH2O-, etc.
KW - argon plasma jet
KW - chemistry pathways
KW - diffuse discharge
KW - ethanol
UR - https://www.scopus.com/pages/publications/85048139347
U2 - 10.1088/1361-6595/aabdc1
DO - 10.1088/1361-6595/aabdc1
M3 - 文章
AN - SCOPUS:85048139347
SN - 0963-0252
VL - 27
JO - Plasma Sources Science and Technology
JF - Plasma Sources Science and Technology
IS - 5
M1 - 055001
ER -