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Surface patterning of glass via electrostatic imprinting using a platinum mold

  • Sung Won Youn
  • , Hideki Takagi
  • , Sang Cheon Park
  • , Masaharu Takahashi
  • , Ryutaro Maeda
  • National Institute of Advanced Industrial Science and Technology

科研成果: 期刊稿件 › 文章 › 同行评审

4 引用 (Scopus)

摘要

Electrostatic imprinting is a highly suitable process for patterning large area and high efficiency glasses because it enables glass patterning at low temperatures with low pressures. Because high DC voltage bias is applied to the mold and glass during the thermal imprinting, the mold materials should have electrical conductivity, appropriate glass adhesion properties, and excellent thermal and electrochemical stability. In this study, thin Pt/Ni molds were fabricated via Si micromachining and electroforming techniques and were then used in the electrostatic imprint process in order to evaluate their feasibility as molds. Under the investigated process conditions, the pattern transfer to glass was accomplished without noticeable degradation of the mold. Furthermore, the process parameter effects on replication fidelity and potential defects were investigated.

源语言英语
页(从-至)3181-3185
页数5
期刊Journal of Nanoscience and Nanotechnology
卷12
期4
DOI
出版状态已出版 - 2012
已对外发布是

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