摘要
Electrostatic imprinting is a highly suitable process for patterning large area and high efficiency glasses because it enables glass patterning at low temperatures with low pressures. Because high DC voltage bias is applied to the mold and glass during the thermal imprinting, the mold materials should have electrical conductivity, appropriate glass adhesion properties, and excellent thermal and electrochemical stability. In this study, thin Pt/Ni molds were fabricated via Si micromachining and electroforming techniques and were then used in the electrostatic imprint process in order to evaluate their feasibility as molds. Under the investigated process conditions, the pattern transfer to glass was accomplished without noticeable degradation of the mold. Furthermore, the process parameter effects on replication fidelity and potential defects were investigated.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 3181-3185 |
| 页数 | 5 |
| 期刊 | Journal of Nanoscience and Nanotechnology |
| 卷 | 12 |
| 期 | 4 |
| DOI | |
| 出版状态 | 已出版 - 2012 |
| 已对外发布 | 是 |
学术指纹
探究 'Surface patterning of glass via electrostatic imprinting using a platinum mold' 的科研主题。它们共同构成独一无二的学术指纹。引用此
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver