摘要
Structural color in thin films offers promising applications in optical encryption and anti-counterfeiting. The conventional solution-based methods struggle with continuous thickness control and patterning compatibility. Multicolor modulation of single-matter films is achieved by introducing a soft plasma etching technique that can uniformly thin the films. Combined with an improved transfer matrix method that can accurately simulate the thin-film interference effect, the film color can be simulated. It not only enables the precise modulation of film color, but also establishes a data set for neural networks. The addition of neural networks extends the application of structural color and the application of information anti-counterfeiting and encryption is demonstrated (with 99% accuracy). This dual approach of physical etching and intelligent design establishes a powerful platform for structural color engineering, opening up possibilities for secure imaging and dynamic optical devices.
| 源语言 | 英语 |
|---|---|
| 期刊论文编号 | 2500630 |
| 期刊 | Advanced Engineering Materials |
| 卷 | 27 |
| 期 | 17 |
| DOI | |
| 出版状态 | 已出版 - 9月 2025 |
学术指纹
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