Strain rate sensitivity of nanoindentation creep in polycrystalline Al film on Silicon substrate

F. Wang; P. Huang; K. Xu

doi:10.1016/j.surfcoat.2006.07.114

Strain rate sensitivity of nanoindentation creep in polycrystalline Al film on Silicon substrate

F. Wang
, P. Huang
, K. Xu

材料科学与工程学院

Xi'an Jiaotong University

科研成果: 期刊稿件 › 文章 › 同行评审

33 引用（Scopus）

摘要

Nanoindentation creep tests on ultra fine crystalline Al thin films with 3000 nm thickness were conducted under indentation strain rate of 0.01 s^{- 1}, 0.05 s^{- 1} and 0.1 s^{- 1}. The stress exponents increase with indentation strain rate, and the effect of strain rate sensitivity on creep property of Al thin films in large indentation is slightly higher than small indention.

源语言	英语
页（从-至）	5216-5218
页数	3
期刊	Surface and Coatings Technology
卷	201
期	9-11 SPEC. ISS.
DOI	https://doi.org/10.1016/j.surfcoat.2006.07.114
出版状态	已出版 - 26 2月 2007

访问文件

10.1016/j.surfcoat.2006.07.114

其它文件与链接

链接到 Scopus 的出版物

引用此

@article{70d587a549554e85acd0c51406f97b76,

title = "Strain rate sensitivity of nanoindentation creep in polycrystalline Al film on Silicon substrate",

abstract = "Nanoindentation creep tests on ultra fine crystalline Al thin films with 3000 nm thickness were conducted under indentation strain rate of 0.01 s- 1, 0.05 s- 1 and 0.1 s- 1. The stress exponents increase with indentation strain rate, and the effect of strain rate sensitivity on creep property of Al thin films in large indentation is slightly higher than small indention.",

keywords = "Nanoindentation creep, Stress exponent, Thin film",

author = "F. Wang and P. Huang and K. Xu",

year = "2007",

month = feb,

day = "26",

doi = "10.1016/j.surfcoat.2006.07.114",

language = "英语",

volume = "201",

pages = "5216--5218",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

number = "9-11 SPEC. ISS.",

}

TY - JOUR

T1 - Strain rate sensitivity of nanoindentation creep in polycrystalline Al film on Silicon substrate

AU - Wang, F.

AU - Huang, P.

AU - Xu, K.

PY - 2007/2/26

Y1 - 2007/2/26

N2 - Nanoindentation creep tests on ultra fine crystalline Al thin films with 3000 nm thickness were conducted under indentation strain rate of 0.01 s- 1, 0.05 s- 1 and 0.1 s- 1. The stress exponents increase with indentation strain rate, and the effect of strain rate sensitivity on creep property of Al thin films in large indentation is slightly higher than small indention.

AB - Nanoindentation creep tests on ultra fine crystalline Al thin films with 3000 nm thickness were conducted under indentation strain rate of 0.01 s- 1, 0.05 s- 1 and 0.1 s- 1. The stress exponents increase with indentation strain rate, and the effect of strain rate sensitivity on creep property of Al thin films in large indentation is slightly higher than small indention.

KW - Nanoindentation creep

KW - Stress exponent

KW - Thin film

UR - https://www.scopus.com/pages/publications/33846530535

U2 - 10.1016/j.surfcoat.2006.07.114

DO - 10.1016/j.surfcoat.2006.07.114

M3 - 文章

AN - SCOPUS:33846530535

SN - 0257-8972

VL - 201

SP - 5216

EP - 5218

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 9-11 SPEC. ISS.

ER -

Strain rate sensitivity of nanoindentation creep in polycrystalline Al film on Silicon substrate

摘要

访问文件

其它文件与链接

学术指纹

引用此