Stereolithography process based on double exposal method

L. Ma; D. C. Li; Y. G. Duan; B. C. Lu

Stereolithography process based on double exposal method

L. Ma
, D. C. Li
, Y. G. Duan
, B. C. Lu

机械工程学院

Xi'an Jiaotong University

科研成果: 期刊稿件 › 文章 › 同行评审

3 引用（Scopus）

摘要

The warpage is dominated by laser scanning strategy to a great extent and it is a key factor leading to the loss of part accuracy in SL process. Based on the study of effects of laser power, scanning velocity and gap on cure depth and cure width, the double expose method had been used in an experiment. Moreover, the traditional method has been improved by subdividing scanning with various speeds, and an improved double expose method is proposed. It is tested that the improved method can not only reduce the warpage, but also ensure the accuracy of the prototype.

源语言	英语
页（从-至）	57-60+65
期刊	Hsi-An Chiao Tung Ta Hsueh/Journal of Xi'an Jiaotong University
卷	35
期	1
出版状态	已出版 - 1月 2001

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引用此

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title = "Stereolithography process based on double exposal method",

abstract = "The warpage is dominated by laser scanning strategy to a great extent and it is a key factor leading to the loss of part accuracy in SL process. Based on the study of effects of laser power, scanning velocity and gap on cure depth and cure width, the double expose method had been used in an experiment. Moreover, the traditional method has been improved by subdividing scanning with various speeds, and an improved double expose method is proposed. It is tested that the improved method can not only reduce the warpage, but also ensure the accuracy of the prototype.",

keywords = "Double expose method, Stereolithography (SL), Warpage",

author = "L. Ma and Li, \{D. C.\} and Duan, \{Y. G.\} and Lu, \{B. C.\}",

year = "2001",

month = jan,

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T1 - Stereolithography process based on double exposal method

AU - Ma, L.

AU - Li, D. C.

AU - Duan, Y. G.

AU - Lu, B. C.

PY - 2001/1

Y1 - 2001/1

N2 - The warpage is dominated by laser scanning strategy to a great extent and it is a key factor leading to the loss of part accuracy in SL process. Based on the study of effects of laser power, scanning velocity and gap on cure depth and cure width, the double expose method had been used in an experiment. Moreover, the traditional method has been improved by subdividing scanning with various speeds, and an improved double expose method is proposed. It is tested that the improved method can not only reduce the warpage, but also ensure the accuracy of the prototype.

AB - The warpage is dominated by laser scanning strategy to a great extent and it is a key factor leading to the loss of part accuracy in SL process. Based on the study of effects of laser power, scanning velocity and gap on cure depth and cure width, the double expose method had been used in an experiment. Moreover, the traditional method has been improved by subdividing scanning with various speeds, and an improved double expose method is proposed. It is tested that the improved method can not only reduce the warpage, but also ensure the accuracy of the prototype.

KW - Double expose method

KW - Stereolithography (SL)

KW - Warpage

UR - https://www.scopus.com/pages/publications/0034876971

M3 - 文章

AN - SCOPUS:0034876971

SN - 0253-987X

VL - 35

SP - 57-60+65

JO - Hsi-An Chiao Tung Ta Hsueh/Journal of Xi'an Jiaotong University

JF - Hsi-An Chiao Tung Ta Hsueh/Journal of Xi'an Jiaotong University

IS - 1

ER -

Stereolithography process based on double exposal method

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