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Split singularities and dislocation injection in strained silicon

  • Harvard University
  • Eindhoven University of Technology

科研成果: 期刊稿件文章同行评审

18 引用 (Scopus)

摘要

In a microelectronic device, the strain field may be intensified at a sharp feature, such as an edge or a corner, injecting dislocations into silicon and ultimately failing the device. The strain field at an edge is singular and is often a linear superposition of two modes of different exponents. We characterize the relative contribution of the two modes by a mode angle, and determine the critical slip systems as the amplitude of the load increases. We calculate the critical residual stress in a thin-film stripe bonded on a silicon substrate.

源语言英语
文章编号023502
期刊Journal of Applied Physics
102
2
DOI
出版状态已出版 - 2007
已对外发布

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