摘要
Graphene is fabricated by thermal decomposition of silicon carbide (SiC) and Pb islands are deposited by Pb flux in molecular beam epitaxy chamber. It is found that graphene domains and SiC buffer layer coexist. Selective growth of Pb islands on SiC buffer layer rather than on graphene domains is observed. It can be ascribed to the higher adsorption energy of Pb atoms on the 63 reconstruction of SiC. However, once Pb islands nucleate on graphene domains, they will grow very large owing to the lower diffusion barrier of Pb atoms on graphene. The results are consistent with first-principle calculations. Since Pb atoms on graphene are nearly free-standing, Pb islands grow in even-number mode.
| 源语言 | 英语 |
|---|---|
| 文章编号 | 065304 |
| 期刊 | Journal of Applied Physics |
| 卷 | 117 |
| 期 | 6 |
| DOI | |
| 出版状态 | 已出版 - 14 2月 2015 |
学术指纹
探究 'Selective growth of Pb islands on graphene/SiC buffer layers' 的科研主题。它们共同构成独一无二的指纹。引用此
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