TY - GEN
T1 - Regulation of Surface Trap Distribution on Silicone Rubber by Radio Frequency Fluorocarbon Plasma
AU - Han, Wenhu
AU - Wang, Chenxu
AU - Zhang, Bo
AU - Sun, Yuhao
AU - Yang, Xiong
AU - Zhang, Guanjun
N1 - Publisher Copyright:
© 2021 IEEE.
PY - 2021
Y1 - 2021
N2 - The surface trap distribution of insulating materials has a significant effect on the electrical resistance along the surface. Therefore, RF capacitive coupled plasma (CCP) was applied to modify the surface of silicone rubber in low-pressure CF4 gas. A one-dimensional fluid model of CCP based COMSOL simulation software was established. The electron temperature, electron number density, and ion density distribution of plasma were analyzed, and the surface treatment parameters of plasma were determined. The surface morphology and chemical structure of samples were observed by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The charge attenuation and the trap distribution were measured by an isothermal surface potential attenuation system. The results show that CCP treatment can introduce fluorinated groups into the surface of silicone rubber and increase the surface roughness. After CCP treatment, the surface charge attenuation of silicone rubber is inhibited and the electron trap is deepened, which is beneficial to suppress the development of secondary electron collapse on the surface and improve its electrical resistance along the surface.
AB - The surface trap distribution of insulating materials has a significant effect on the electrical resistance along the surface. Therefore, RF capacitive coupled plasma (CCP) was applied to modify the surface of silicone rubber in low-pressure CF4 gas. A one-dimensional fluid model of CCP based COMSOL simulation software was established. The electron temperature, electron number density, and ion density distribution of plasma were analyzed, and the surface treatment parameters of plasma were determined. The surface morphology and chemical structure of samples were observed by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The charge attenuation and the trap distribution were measured by an isothermal surface potential attenuation system. The results show that CCP treatment can introduce fluorinated groups into the surface of silicone rubber and increase the surface roughness. After CCP treatment, the surface charge attenuation of silicone rubber is inhibited and the electron trap is deepened, which is beneficial to suppress the development of secondary electron collapse on the surface and improve its electrical resistance along the surface.
KW - CF4
KW - RF capacitive coupled plasma
KW - Silicon rubber
KW - Surface trap distribution
UR - https://www.scopus.com/pages/publications/85125049562
U2 - 10.1109/CIYCEE53554.2021.9676754
DO - 10.1109/CIYCEE53554.2021.9676754
M3 - 会议稿件
AN - SCOPUS:85125049562
T3 - 2021 IEEE 2nd China International Youth Conference on Electrical Engineering, CIYCEE 2021
BT - 2021 IEEE 2nd China International Youth Conference on Electrical Engineering, CIYCEE 2021
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2nd IEEE China International Youth Conference on Electrical Engineering, CIYCEE 2021
Y2 - 15 December 2021 through 17 December 2021
ER -