TY - CHAP
T1 - Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure
AU - Ma, Chunrui
AU - Chen, Chonglin
N1 - Publisher Copyright:
© 2016Wiley-VCH Verlag GmbH & Co. KGaA.
PY - 2016/1/1
Y1 - 2016/1/1
N2 - Pulsed laser deposition (PLD) is one of the most promising techniques for the formation of complex-oxide heterostructures and nanostructure due to its simple setup and it can stoichiometrically transfer a material from a solid source to a substrate to form its thin film. This chapter details the PLD setup and focus primarily on operating principle, growth mechanism and parameter of PLD for complex oxide thin film and nanostructure.
AB - Pulsed laser deposition (PLD) is one of the most promising techniques for the formation of complex-oxide heterostructures and nanostructure due to its simple setup and it can stoichiometrically transfer a material from a solid source to a substrate to form its thin film. This chapter details the PLD setup and focus primarily on operating principle, growth mechanism and parameter of PLD for complex oxide thin film and nanostructure.
KW - Complex oxide thin film
KW - Mechanism of thin film growth
KW - Nanostructure growth
KW - Parameters in the thin film growth
KW - Pulsed laser deposition
UR - https://www.scopus.com/pages/publications/105000563355
U2 - 10.1002/9783527696406.ch1
DO - 10.1002/9783527696406.ch1
M3 - 章节
AN - SCOPUS:105000563355
SN - 9783527340255
SP - 15
EP - 45
BT - Advanced Nano Deposition Methods
PB - wiley
ER -