Process parameters of mold fabrication for nano-imprint lithography

Yan Le; Hansong Li; Hongzhong Liu

doi:10.1109/iCECE.2010.1316

Process parameters of mold fabrication for nano-imprint lithography

Yan Le
, Hansong Li
, Hongzhong Liu

机械工程学院

Beijing Information Science & Technology University
Xi'an Jiaotong University

科研成果: 书/报告/会议事项章节 › 会议稿件 › 同行评审

1 引用（Scopus）

摘要

In nano-imprint lithography, PDMS is chosen to be soft mold material, which has features of excellent demolding character and large transferring area of imprinting pattern. Besides, the soft mold uses quartz as substrate. Impacts of technical parameters, such as the vacuum casting pressure, the curing temperature and time, on PDMS performance are analyzed. The experiments results show that the vacuum pressure is 2.3×10^-2 Pa; the curing temperature is 40 °C, and the curing time is 45 hours. These optimized parameters keep adequate demold and pattern accuracy, thus adoption of PDMS soft mold could not only fulfill the precision NIL process, but also improve productivity.

源语言	英语
主期刊名	Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010
页	5421-5424
页数	4
DOI	https://doi.org/10.1109/iCECE.2010.1316
出版状态	已出版 - 2010
活动	International Conference on Electrical and Control Engineering, ICECE 2010 - Wuhan, 中国期限: 26 6月 2010 → 28 6月 2010

出版系列

姓名	Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010

会议

会议	International Conference on Electrical and Control Engineering, ICECE 2010
国家/地区	中国
市	Wuhan
时期	26/06/10 → 28/06/10

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10.1109/iCECE.2010.1316

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链接到 Scopus 的出版物

引用此

@inproceedings{669e4ed7d9fb4aa9be0eb56fb7036c25,

title = "Process parameters of mold fabrication for nano-imprint lithography",

abstract = "In nano-imprint lithography, PDMS is chosen to be soft mold material, which has features of excellent demolding character and large transferring area of imprinting pattern. Besides, the soft mold uses quartz as substrate. Impacts of technical parameters, such as the vacuum casting pressure, the curing temperature and time, on PDMS performance are analyzed. The experiments results show that the vacuum pressure is 2.3×10-2 Pa; the curing temperature is 40 °C, and the curing time is 45 hours. These optimized parameters keep adequate demold and pattern accuracy, thus adoption of PDMS soft mold could not only fulfill the precision NIL process, but also improve productivity.",

keywords = "Imprint lithography, PDMS, Soft mold",

author = "Yan Le and Hansong Li and Hongzhong Liu",

year = "2010",

doi = "10.1109/iCECE.2010.1316",

language = "英语",

isbn = "9780769540313",

series = "Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010",

pages = "5421--5424",

booktitle = "Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010",

note = "International Conference on Electrical and Control Engineering, ICECE 2010 ; Conference date: 26-06-2010 Through 28-06-2010",

}

Le, Y, Li, H & Liu, H 2010, Process parameters of mold fabrication for nano-imprint lithography. 在 Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010., 5630313, Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010, 页码 5421-5424, International Conference on Electrical and Control Engineering, ICECE 2010, Wuhan, 中国, 26/06/10. https://doi.org/10.1109/iCECE.2010.1316

Process parameters of mold fabrication for nano-imprint lithography. / Le, Yan; Li, Hansong; Liu, Hongzhong.
Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010. 2010. 页码 5421-5424 5630313 (Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010).

科研成果: 书/报告/会议事项章节 › 会议稿件 › 同行评审

TY - GEN

T1 - Process parameters of mold fabrication for nano-imprint lithography

AU - Le, Yan

AU - Li, Hansong

AU - Liu, Hongzhong

PY - 2010

Y1 - 2010

N2 - In nano-imprint lithography, PDMS is chosen to be soft mold material, which has features of excellent demolding character and large transferring area of imprinting pattern. Besides, the soft mold uses quartz as substrate. Impacts of technical parameters, such as the vacuum casting pressure, the curing temperature and time, on PDMS performance are analyzed. The experiments results show that the vacuum pressure is 2.3×10-2 Pa; the curing temperature is 40 °C, and the curing time is 45 hours. These optimized parameters keep adequate demold and pattern accuracy, thus adoption of PDMS soft mold could not only fulfill the precision NIL process, but also improve productivity.

AB - In nano-imprint lithography, PDMS is chosen to be soft mold material, which has features of excellent demolding character and large transferring area of imprinting pattern. Besides, the soft mold uses quartz as substrate. Impacts of technical parameters, such as the vacuum casting pressure, the curing temperature and time, on PDMS performance are analyzed. The experiments results show that the vacuum pressure is 2.3×10-2 Pa; the curing temperature is 40 °C, and the curing time is 45 hours. These optimized parameters keep adequate demold and pattern accuracy, thus adoption of PDMS soft mold could not only fulfill the precision NIL process, but also improve productivity.

KW - Imprint lithography

KW - PDMS

KW - Soft mold

UR - https://www.scopus.com/pages/publications/79952221979

U2 - 10.1109/iCECE.2010.1316

DO - 10.1109/iCECE.2010.1316

M3 - 会议稿件

AN - SCOPUS:79952221979

SN - 9780769540313

T3 - Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010

SP - 5421

EP - 5424

BT - Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010

T2 - International Conference on Electrical and Control Engineering, ICECE 2010

Y2 - 26 June 2010 through 28 June 2010

ER -

Process parameters of mold fabrication for nano-imprint lithography

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