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Preparation of ferroelectric capacitor films onto the releasable substrate and its application to nano-transfer method

  • Masaaki Ichiki
  • , Keita Iimura
  • , Toshifumi Hosono
  • , Keisuke Kuroki
  • , Fumiaki Tomioka
  • , Tadatomo Suga
  • , Ryutaro Maeda
  • , Toshihiro Itoh

科研成果: 书/报告/会议事项章节会议稿件同行评审

1 引用 (Scopus)

摘要

High dielectric capacitor, that has around 1000 in dielectric constant, can be successfully formed by nanotransfer on non-heat-resisting substrates. PZT film could be released from the Si substrate and bonded onto the polymer one. The releasing characteristics have the relationships with the thickness of Pt layer. The formed PZT has perovskite structure and clear columnar texture. The proposal of the structure of electrode using Ti is shown in case of the stress film.

源语言英语
主期刊名2010 IEEE CPMT Symposium Japan, ICSJ10
DOI
出版状态已出版 - 2010
已对外发布
活动2010 IEEE CPMT Symposium Japan, ICSJ10 - Tokyo, 日本
期限: 24 8月 201026 8月 2010

出版系列

姓名2010 IEEE CPMT Symposium Japan, ICSJ10

会议

会议2010 IEEE CPMT Symposium Japan, ICSJ10
国家/地区日本
Tokyo
时期24/08/1026/08/10

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