Preliminary results from key experiments on sources for EUV lithography

R. Lebert; L. Aschke; K. Bergmann; S. Düsterer; K. Gäbel; D. Hoffmann; P. Loosen; W. Neff; P. Nickles; O. Rosier; R. Poprawe; D. Rudolph; W. Sandner; R. Sauerbrey; G. Schmahl; H. Schwoerer; H. Stiehl; I. Will; C. Ziener

doi:10.1016/S0167-9317(01)00533-0

Preliminary results from key experiments on sources for EUV lithography

R. Lebert
, L. Aschke
, K. Bergmann
, S. Düsterer
, K. Gäbel
, D. Hoffmann
, P. Loosen
, W. Neff
, P. Nickles
, O. Rosier
, R. Poprawe
, D. Rudolph
, W. Sandner
, R. Sauerbrey
, G. Schmahl
, H. Schwoerer
, H. Stiehl
, I. Will
, C. Ziener

Fraunhofer Institute for Laser Technology
Friedrich Schiller University Jena
RWTH Aachen University
Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy
University of Göttingen

科研成果: 期刊稿件 › 文章 › 同行评审

5 引用（Scopus）

摘要

While huge progress has been achieved for EUVL system design and multilayer optics during the last years the decision on the best suited source is still open. In a German basic research cooperation on short-wavelength plasma based sources some key issues also relevant for EUVL are addressed: the comparison of existing sources, investigations on the scalability of source concepts and the demonstration of key features. Preliminary results of investigations on parameters for best conversion efficiency of laser produced plasmas, concepts for high-power lasers and scalability of gas discharge based sources are presented. Comparability of results is assured by calibrated metrology tools which are cross checked with ASML's flying circus.

源语言	英语
页（从-至）	87-92
页数	6
期刊	Microelectronic Engineering
卷	57-58
DOI	https://doi.org/10.1016/S0167-9317(01)00533-0
出版状态	已出版 - 9月 2001
已对外发布	是

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10.1016/S0167-9317(01)00533-0

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Lebert, R., Aschke, L., Bergmann, K., Düsterer, S., Gäbel, K., Hoffmann, D., Loosen, P., Neff, W., Nickles, P., Rosier, O., Poprawe, R., Rudolph, D., Sandner, W., Sauerbrey, R., Schmahl, G., Schwoerer, H., Stiehl, H., Will, I., & Ziener, C. (2001). Preliminary results from key experiments on sources for EUV lithography. Microelectronic Engineering, 57-58, 87-92. https://doi.org/10.1016/S0167-9317(01)00533-0

@article{53102db0c4fa477c8f8e8112c6195c1a,

title = "Preliminary results from key experiments on sources for EUV lithography",

abstract = "While huge progress has been achieved for EUVL system design and multilayer optics during the last years the decision on the best suited source is still open. In a German basic research cooperation on short-wavelength plasma based sources some key issues also relevant for EUVL are addressed: the comparison of existing sources, investigations on the scalability of source concepts and the demonstration of key features. Preliminary results of investigations on parameters for best conversion efficiency of laser produced plasmas, concepts for high-power lasers and scalability of gas discharge based sources are presented. Comparability of results is assured by calibrated metrology tools which are cross checked with ASML's flying circus.",

keywords = "EUVL, LPP discharge, Plasma, Radiation sources",

author = "R. Lebert and L. Aschke and K. Bergmann and S. D{\"u}sterer and K. G{\"a}bel and D. Hoffmann and P. Loosen and W. Neff and P. Nickles and O. Rosier and R. Poprawe and D. Rudolph and W. Sandner and R. Sauerbrey and G. Schmahl and H. Schwoerer and H. Stiehl and I. Will and C. Ziener",

year = "2001",

month = sep,

doi = "10.1016/S0167-9317(01)00533-0",

language = "英语",

volume = "57-58",

pages = "87--92",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

}

Lebert, R, Aschke, L, Bergmann, K, Düsterer, S, Gäbel, K, Hoffmann, D, Loosen, P, Neff, W, Nickles, P, Rosier, O, Poprawe, R, Rudolph, D, Sandner, W, Sauerbrey, R, Schmahl, G, Schwoerer, H, Stiehl, H, Will, I & Ziener, C 2001, 'Preliminary results from key experiments on sources for EUV lithography', Microelectronic Engineering, 卷 57-58, 页码 87-92. https://doi.org/10.1016/S0167-9317(01)00533-0

TY - JOUR

T1 - Preliminary results from key experiments on sources for EUV lithography

AU - Lebert, R.

AU - Aschke, L.

AU - Bergmann, K.

AU - Düsterer, S.

AU - Gäbel, K.

AU - Hoffmann, D.

AU - Loosen, P.

AU - Neff, W.

AU - Nickles, P.

AU - Rosier, O.

AU - Poprawe, R.

AU - Rudolph, D.

AU - Sandner, W.

AU - Sauerbrey, R.

AU - Schmahl, G.

AU - Schwoerer, H.

AU - Stiehl, H.

AU - Will, I.

AU - Ziener, C.

PY - 2001/9

Y1 - 2001/9

N2 - While huge progress has been achieved for EUVL system design and multilayer optics during the last years the decision on the best suited source is still open. In a German basic research cooperation on short-wavelength plasma based sources some key issues also relevant for EUVL are addressed: the comparison of existing sources, investigations on the scalability of source concepts and the demonstration of key features. Preliminary results of investigations on parameters for best conversion efficiency of laser produced plasmas, concepts for high-power lasers and scalability of gas discharge based sources are presented. Comparability of results is assured by calibrated metrology tools which are cross checked with ASML's flying circus.

AB - While huge progress has been achieved for EUVL system design and multilayer optics during the last years the decision on the best suited source is still open. In a German basic research cooperation on short-wavelength plasma based sources some key issues also relevant for EUVL are addressed: the comparison of existing sources, investigations on the scalability of source concepts and the demonstration of key features. Preliminary results of investigations on parameters for best conversion efficiency of laser produced plasmas, concepts for high-power lasers and scalability of gas discharge based sources are presented. Comparability of results is assured by calibrated metrology tools which are cross checked with ASML's flying circus.

KW - EUVL

KW - LPP discharge

KW - Plasma

KW - Radiation sources

UR - https://www.scopus.com/pages/publications/20244368930

U2 - 10.1016/S0167-9317(01)00533-0

DO - 10.1016/S0167-9317(01)00533-0

M3 - 文章

AN - SCOPUS:20244368930

SN - 0167-9317

VL - 57-58

SP - 87

EP - 92

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -

Preliminary results from key experiments on sources for EUV lithography

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