Potential sputtering by Highly Charged Ion bombardment on Au surface

R. Cheng; H. B. Peng; S. J. Liu; Y. C. Han; P. F. Zong; Y. T. Zhao; T. S. Wang

doi:10.1016/j.nuclphysa.2010.01.140

Potential sputtering by Highly Charged Ion bombardment on Au surface

R. Cheng
, H. B. Peng
, S. J. Liu
, Y. C. Han
, P. F. Zong
, Y. T. Zhao
, T. S. Wang

Lanzhou University
CAS - Institute of Modern Physics

科研成果: 期刊稿件 › 文章 › 同行评审

4 引用（Scopus）

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The sputtered particle yields produced by P b^{q +} (q = 4 - 36) with constant kinetic energy bombardment on Au surface were measured. The sputtering could be separated to two parts: no potential sputtering is observed when q < 24 (E_{p o t} = 9.6 keV) and the sputtering yield increases with E_{p o t}^1.2 for the higher charge states of q ≥ 24. The potential sputtering is mainly contributed by the relaxation of electronic excitations on target surface produced by the potential energy transfer from projectile to target atoms.

源语言	英语
页（从-至）	764c-766c
期刊	Nuclear Physics A
卷	834
期	1-4
DOI	https://doi.org/10.1016/j.nuclphysa.2010.01.140
出版状态	已出版 - 1 3月 2010
已对外发布	是

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title = "Potential sputtering by Highly Charged Ion bombardment on Au surface",

abstract = "The sputtered particle yields produced by P bq + (q = 4 - 36) with constant kinetic energy bombardment on Au surface were measured. The sputtering could be separated to two parts: no potential sputtering is observed when q < 24 (Ep o t = 9.6 keV) and the sputtering yield increases with Ep o t1.2 for the higher charge states of q ≥ 24. The potential sputtering is mainly contributed by the relaxation of electronic excitations on target surface produced by the potential energy transfer from projectile to target atoms.",

keywords = "Au, Highly charged ions, level energy matching, potential sputtering",

author = "R. Cheng and Peng, \{H. B.\} and Liu, \{S. J.\} and Han, \{Y. C.\} and Zong, \{P. F.\} and Zhao, \{Y. T.\} and Wang, \{T. S.\}",

year = "2010",

month = mar,

day = "1",

doi = "10.1016/j.nuclphysa.2010.01.140",

language = "英语",

volume = "834",

pages = "764c--766c",

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TY - JOUR

T1 - Potential sputtering by Highly Charged Ion bombardment on Au surface

AU - Cheng, R.

AU - Peng, H. B.

AU - Liu, S. J.

AU - Han, Y. C.

AU - Zong, P. F.

AU - Zhao, Y. T.

AU - Wang, T. S.

PY - 2010/3/1

Y1 - 2010/3/1

N2 - The sputtered particle yields produced by P bq + (q = 4 - 36) with constant kinetic energy bombardment on Au surface were measured. The sputtering could be separated to two parts: no potential sputtering is observed when q < 24 (Ep o t = 9.6 keV) and the sputtering yield increases with Ep o t1.2 for the higher charge states of q ≥ 24. The potential sputtering is mainly contributed by the relaxation of electronic excitations on target surface produced by the potential energy transfer from projectile to target atoms.

AB - The sputtered particle yields produced by P bq + (q = 4 - 36) with constant kinetic energy bombardment on Au surface were measured. The sputtering could be separated to two parts: no potential sputtering is observed when q < 24 (Ep o t = 9.6 keV) and the sputtering yield increases with Ep o t1.2 for the higher charge states of q ≥ 24. The potential sputtering is mainly contributed by the relaxation of electronic excitations on target surface produced by the potential energy transfer from projectile to target atoms.

KW - Au

KW - Highly charged ions

KW - level energy matching

KW - potential sputtering

UR - https://www.scopus.com/pages/publications/76749168114

U2 - 10.1016/j.nuclphysa.2010.01.140

DO - 10.1016/j.nuclphysa.2010.01.140

M3 - 文章

AN - SCOPUS:76749168114

SN - 0375-9474

VL - 834

SP - 764c-766c

JO - Nuclear Physics A

JF - Nuclear Physics A

IS - 1-4

ER -

Potential sputtering by Highly Charged Ion bombardment on Au surface

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