Porous aromatic frameworks as HF resistant adsorbents for SF₆ separation at elevated pressure

The public concern about sulfur hexafluoride (SF₆) emission has driven the exploration of related removal processes via adsorptive separation technology. Based on task-specific porous materials, the capture of SF₆ achieves lower energy consumption and less carbon footprint. Herein, four HF resistant porous aromatic frameworks (PAF-XJTU-1 to PAF-XJTU-4) with robust C–C linkage were prepared for the separation of SF₆ in semiconductor etching exhaust. Single-component gas adsorption and IAST selectivity confirmed the separation performance of the four PAFs materials under elevated pressure (10 bar). Moreover, DFT studies revealed the nonnegligible SF₆ intermolecular interaction in PAFs at elevated pressure. Under the dynamic scenario, breakthrough experiments proved the effective capture of SF₆ in PAF-XJTUs.