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Physics and technology of electronic insulator-to-metal transition (E-IMT) for record high on/off ratio and low voltage in device applications

  • Jianqiang Lin
  • , Khan Alam
  • , Leonidas Ocola
  • , Zhen Zhang
  • , Suman Datta
  • , Shriram Ramanathan
  • , Supratik Guha
  • Argonne National Laboratory
  • The University of Chicago
  • Purdue University
  • University of Notre Dame

科研成果: 书/报告/会议事项章节会议稿件同行评审

11 引用 (Scopus)

摘要

New device concepts related to both computing and biological function emulation are emerging rapidly based upon the electronic insulator-to-metal transition (E-IMT) effect that some oxides, such as VO2, exhibit. However, the experimental E-IMT devices to-date are limited to an ON/OFF ratio of ∼102, resulting in a small and inadequate dynamic range in device operation. In addition, the voltage that drives the E-IMT is high, typically above 1 V. In this paper, we investigate the physics and technology toward realizing both high ON/OFF and low-voltage E-IMT devices. We show that, the ON/OFF ratio, critical E-IMT voltage, and device reliability are closely coupled. A predictive model is developed and shows that, for reliable operation, the maximum ON/OFF ratio of an E-IMT device should follow a square-root relation with the strength of the thermally driven insulator-to-metal transition (T-IMT). This new design rule is verified by systematic experiments using prototypical VO2 E-IMT devices. Through this study, we achieve a record value of reliable E-IMT with an ON/OFF ratio of 3.5×103 at 1.2 V - greater than 10x improvement over the previous state-of-the-art. A record low voltage of IMT switching at 0.3 V (ON/OFF ratio = 20) is also demonstrated. The proposed universal design rule is widely applicable for a range of emerging applications based on E-IMT devices. As an experimental example, the E-IMT based transistors show an ultra-steep subthreshold swing (<1mV/dec) and ON/OFF ratio >103.

源语言英语
主期刊名2017 IEEE International Electron Devices Meeting, IEDM 2017
出版商Institute of Electrical and Electronics Engineers Inc.
23.4.1-23.4.4
ISBN(电子版)9781538635599
DOI
出版状态已出版 - 23 1月 2018
已对外发布
活动63rd IEEE International Electron Devices Meeting, IEDM 2017 - San Francisco, 美国
期限: 2 12月 20176 12月 2017

丛书

姓名Technical Digest - International Electron Devices Meeting, IEDM
ISSN(印刷版)0163-1918

会议

会议63rd IEEE International Electron Devices Meeting, IEDM 2017
国家/地区美国
San Francisco
时期2/12/176/12/17

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