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Persistent step-flow growth of strained films on vicinal substrates

  • Wei Hong
  • , Ho Nyung Lee
  • , Mina Yoon
  • , Hans M. Christen
  • , Douglas H. Lowndes
  • , Zhigang Suo
  • , Zhenyu Zhang
  • Harvard University
  • Oak Ridge National Laboratory
  • University of Tennessee

科研成果: 期刊稿件文章同行评审

125 引用 (Scopus)

摘要

We propose a model of persistent step flow, emphasizing dominant kinetic processes and strain effects. Within this model, we construct a morphological phase diagram, delineating a regime of step flow from regimes of step bunching and island formation. In particular, we predict the existence of concurrent step bunching and island formation, a new growth mode that competes with step flow for phase space, and show that the deposition flux and temperature must be chosen within a window in order to achieve persistent step flow. The model rationalizes the diverse growth modes observed in pulsed laser deposition of SrRuO3 on SrTiO3.

源语言英语
文章编号095501
期刊Physical Review Letters
95
9
DOI
出版状态已出版 - 26 8月 2005
已对外发布

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