摘要
The oxidation behavior of Mo2Ni3Si based ternary metal silicide alloy toughened by small amount of nickel-base solid solution (γ) was investigated at 1173 K. The oxide scale was observed to have a duplex structure consisting of a top columnar NiO layer and an internal NiO-SiO2 mixed layer with continuous SiO2 formed at its base. The continuous SiO2 layer made a significant contribution to the low oxidation rate through preventing the diffusion of oxygen and Ni2+. While, the cracks existing in the oxide scale due to growth stress, thermal stress and volatilization of MoO3 provided rapid diffusion paths for oxygen and Ni2+ and deteriorated the alloy's oxidation resistance.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 239-243 |
| 页数 | 5 |
| 期刊 | Journal of Alloys and Compounds |
| 卷 | 457 |
| 期 | 1-2 |
| DOI | |
| 出版状态 | 已出版 - 12 6月 2008 |
| 已对外发布 | 是 |
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