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Oxidation behavior of γ/Mo2Ni3Si ternary metal silicide alloy

  • Beihang University

科研成果: 期刊稿件文章同行评审

21 引用 (Scopus)

摘要

The oxidation behavior of Mo2Ni3Si based ternary metal silicide alloy toughened by small amount of nickel-base solid solution (γ) was investigated at 1173 K. The oxide scale was observed to have a duplex structure consisting of a top columnar NiO layer and an internal NiO-SiO2 mixed layer with continuous SiO2 formed at its base. The continuous SiO2 layer made a significant contribution to the low oxidation rate through preventing the diffusion of oxygen and Ni2+. While, the cracks existing in the oxide scale due to growth stress, thermal stress and volatilization of MoO3 provided rapid diffusion paths for oxygen and Ni2+ and deteriorated the alloy's oxidation resistance.

源语言英语
页(从-至)239-243
页数5
期刊Journal of Alloys and Compounds
457
1-2
DOI
出版状态已出版 - 12 6月 2008
已对外发布

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