@inproceedings{4d1ffc2adf3c4beba0f2c89f1d574e3d,
title = "Novel nano-scale overlay alignment method for room-temperature imprint lithography",
abstract = "A novel nano-scale alignment technique based on Moir{\'e} fringe for room-temperature imprint lithography in the submicron realm is proposed. A pair of special slant gratings is used as alignment marks on the wafer and template respectively. Moir{\'e} signals generated by alignment marks are projected onto a photo-detector array, then the detected signals are used to estimate the alignment errors in x and y directions respectively. Test results indicate that complex differential Moir{\'e} signal is more sensitive to relative displacement of the pair of marks than each single Moir{\'e} signal, and the alignment resolutions obtained in x and y directions are ±20nm (3σ) and ±25nm(3σ) respectively. They can meet the requirement of alignment accuracy for submicron imprint lithography.",
keywords = "Imprint lithography, Moir{\'e} signal, Nano-scale alignment",
author = "Li Wang and Yucheng Ding and Bingheng Lu and Zhihui Qiu and Hongzhong Liu",
year = "2006",
doi = "10.1117/12.674257",
language = "英语",
isbn = "0819461881",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",
note = "2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies - Advanced Optical Manufacturing and Testing Technologies ; Conference date: 02-11-2005 Through 05-11-2005",
}