Morphology evolution and photocatalytic applications of W-doped Bi₂O₃ films prepared using unique oblique angle co-sputtering technology

A novel technology (co-sputtering oblique angle deposition) was used for fabricating W-doped Bi₂O₃ films. After further annealing at 500 °C, the surface morphologies and microstructures of the films were characterized by scanning electron microscopy and X-ray diffraction. With increase in the sputtering current of W target in co-sputtering process, the surface morphology of W-doped Bi₂O₃ films changed significantly. The mechanism of morphology evolution was systematically studied. The optical properties of W-doped Bi₂O₃ films such as band gap and photocatalytic performance were also investigated. The results indicate that this co-sputtering oblique angle deposition technology is a promising new method for investigating the nanostructures photocatalytic and other performance of doped materials.