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Microstructural and Electron-Emission Characteristics of Nb-Si-N Films in Surface-Conduction Electron-Emitter Display

  • Huiyan Wu
  • , Jianfeng Wang
  • , Zhongxiao Song
  • , Shengli Wu
  • , Yanhuai Li
  • , Siliang Xiong
  • , Kewei Xu
  • , Chunliang Liu
  • Xi'an Jiaotong University

科研成果: 书/报告/会议事项章节会议稿件同行评审

5 引用 (Scopus)

摘要

We proposed ternary nitride Nb-Si-N film as a promising surface-conduction electron emitter (SCE) in surface-conduction electron-emitter display (SED). Nb-Si-N films consisted of continuous NbN polycrystalline phase with (Si3-xNb4x)N4 amorphous phase in NbN grain boundaries. After electroforming, serrated nanogaps were observed in Nb-Si-N SCE strips. The emission current of Nb-Si-N SCE array of 1×18 cells was 6.50 μA with anode voltage of 1.5 kV and device voltage of 22 V, indicating satisfying potential for display applications comparing with NbN SCEs.

源语言英语
主期刊名18th International Vacuum Congress, IVC 2010
编辑Feng Pan, Xu Chen
出版商Elsevier B.V.
139-143
页数5
ISBN(电子版)9781627487481
DOI
出版状态已出版 - 2012
活动18th International Vacuum Congress, IVC 2010 - Beijing, 中国
期限: 23 8月 201027 8月 2010

出版系列

姓名Physics Procedia
32
ISSN(印刷版)1875-3884
ISSN(电子版)1875-3892

会议

会议18th International Vacuum Congress, IVC 2010
国家/地区中国
Beijing
时期23/08/1027/08/10

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