摘要
Based on surface micromachining process, the rough mask information is obtained by means of the operation on geometric elements among the layer models. The precise mask then is formed by revising the rough mask based on the process restrictions. Together with the reconstruction of the process model, the mask revision resolves the problem of multiple-layer etching and improves the manufacturability. The CAPP and CAD modules for micro devices are integrated coordinately to get an optimized design model and mask set.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 798-803 |
| 页数 | 6 |
| 期刊 | Jisuanji Fuzhu Sheji Yu Tuxingxue Xuebao/Journal of Computer-Aided Design and Computer Graphics |
| 卷 | 19 |
| 期 | 6 |
| 出版状态 | 已出版 - 6月 2007 |
学术指纹
探究 'Mask deduction for surface micromachining to support top-down design flow' 的科研主题。它们共同构成独一无二的学术指纹。引用此
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