Investigation on fabrication process and structural fidelity of the flash grating

For the wavelength division applications to the gas measurement, the Si-based PMMA flash grating has been fabricated through preparing PMMA film on Si substrate by using the hot-embossing lithography (HEL) and the follow-up processes in this work. The fidelity of the duplicated flash grating has also been studied and analyzed by experiment. The results showed that the micro-flash grating with high fidelity could be obtained by preparing PMMA film and using the HEL as well as the follow-up processes. The reported flash grating has significant cost-effective advantage over the conventional flash grating.