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Interface electronic structure in a metal/ferroelectric heterostructure under applied bias

  • J. E. Rault
  • , G. Agnus
  • , T. Maroutian
  • , V. Pillard
  • , Ph Lecoeur
  • , G. Niu
  • , B. Vilquin
  • , M. G. Silly
  • , A. Bendounan
  • , F. Sirotti
  • , N. Barrett
  • Commissariat à l’énergie atomique et aux énergies alternatives
  • Université Paris-Saclay
  • École centrale de Lyon
  • L'orme des merisiers

科研成果: 期刊稿件文章同行评审

47 引用 (Scopus)

摘要

The effective barrier height between an electrode and a ferroelectric (FE) depends on both macroscopic electrical properties and microscopic chemical and electronic structure. The behavior of a prototypical electrode/FE/electrode structure, Pt/BaTiO3/Nb-doped SrTiO3, under in-situ bias voltage is investigated using x-ray photoelectron spectroscopy. The full band alignment is measured and is supported by transport measurements. Barrier heights depend on interface chemistry and on the FE polarization. A differential response of the core levels to applied bias as a function of the polarization state is observed, consistent with Callen charge variations near the interface.

源语言英语
文章编号155146
期刊Physical Review B - Condensed Matter and Materials Physics
87
15
DOI
出版状态已出版 - 26 4月 2013
已对外发布

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