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Interface and Doping Engineering of HfO Based Multi-Level RRAM: Towards Synaptic Simulation for Neuromorphic Computation

  • Xi'an Jiaotong University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

An ability to simulate synaptic behavior by interface and doping engineering has been reported. A significant improvement in on/off ratio can be obtained by ozone oxidation pre-treatment on a RRAM device. The improved resistive switching behavior with high memory windows can be obtained by Al3+ doping and post deposition annealing helps the device to better show synaptic characteristics.

源语言英语
主期刊名17th IEEE International Conference on IC Design and Technology, ICICDT 2019 - Proceedings
出版商Institute of Electrical and Electronics Engineers Inc.
ISBN(电子版)9781728118536
DOI
出版状态已出版 - 6月 2019
活动17th IEEE International Conference on IC Design and Technology, ICICDT 2019 - Suzhou, 中国
期限: 17 6月 201919 6月 2019

丛书

姓名17th IEEE International Conference on IC Design and Technology, ICICDT 2019 - Proceedings

会议

会议17th IEEE International Conference on IC Design and Technology, ICICDT 2019
国家/地区中国
Suzhou
时期17/06/1919/06/19

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