Influence of sputtering bias on the microstructure and properties of Nb-Si-N films

Jianfeng Wang; Zhongxiao Song; Kewei Xu

doi:10.1016/j.surfcoat.2006.07.082

Influence of sputtering bias on the microstructure and properties of Nb-Si-N films

Jianfeng Wang
, Zhongxiao Song
, Kewei Xu

材料科学与工程学院

Xi'an Jiaotong University

科研成果: 期刊稿件 › 文章 › 同行评审

25 引用（Scopus）

摘要

Nb-Si-N films were sputtered by radio frequency powered reactive magnetron sputtering with different bias voltages. The influence of sputtering bias on the microstructure and properties of Nb-Si-N films was studied. The results reveal that as the bias voltage increases the Nb/Si ratio and the surface roughness increase. The microstructure of Nb-Si-N films is the nano-composite structure with nano-sized NbN grains embedded in amorphous SiN_x phase. High sputtering bias is in favor of the growth of NbN grains in the Nb-Si-N films. As the bias increases the ε-NbN phase increases. The sheet resistance and microhardness of Nb-Si-N films also change as the bias varies. This phenomenon may be related with the ε-NbN phase in some degree.

源语言	英语
页（从-至）	4931-4934
页数	4
期刊	Surface and Coatings Technology
卷	201
期	9-11 SPEC. ISS.
DOI	https://doi.org/10.1016/j.surfcoat.2006.07.082
出版状态	已出版 - 26 2月 2007

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10.1016/j.surfcoat.2006.07.082

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title = "Influence of sputtering bias on the microstructure and properties of Nb-Si-N films",

abstract = "Nb-Si-N films were sputtered by radio frequency powered reactive magnetron sputtering with different bias voltages. The influence of sputtering bias on the microstructure and properties of Nb-Si-N films was studied. The results reveal that as the bias voltage increases the Nb/Si ratio and the surface roughness increase. The microstructure of Nb-Si-N films is the nano-composite structure with nano-sized NbN grains embedded in amorphous SiNx phase. High sputtering bias is in favor of the growth of NbN grains in the Nb-Si-N films. As the bias increases the ε-NbN phase increases. The sheet resistance and microhardness of Nb-Si-N films also change as the bias varies. This phenomenon may be related with the ε-NbN phase in some degree.",

keywords = "Magnetron sputtering, Microstructure, Nb-Si-N films, Properties",

author = "Jianfeng Wang and Zhongxiao Song and Kewei Xu",

year = "2007",

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day = "26",

doi = "10.1016/j.surfcoat.2006.07.082",

language = "英语",

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pages = "4931--4934",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

number = "9-11 SPEC. ISS.",

}

TY - JOUR

T1 - Influence of sputtering bias on the microstructure and properties of Nb-Si-N films

AU - Wang, Jianfeng

AU - Song, Zhongxiao

AU - Xu, Kewei

PY - 2007/2/26

Y1 - 2007/2/26

N2 - Nb-Si-N films were sputtered by radio frequency powered reactive magnetron sputtering with different bias voltages. The influence of sputtering bias on the microstructure and properties of Nb-Si-N films was studied. The results reveal that as the bias voltage increases the Nb/Si ratio and the surface roughness increase. The microstructure of Nb-Si-N films is the nano-composite structure with nano-sized NbN grains embedded in amorphous SiNx phase. High sputtering bias is in favor of the growth of NbN grains in the Nb-Si-N films. As the bias increases the ε-NbN phase increases. The sheet resistance and microhardness of Nb-Si-N films also change as the bias varies. This phenomenon may be related with the ε-NbN phase in some degree.

AB - Nb-Si-N films were sputtered by radio frequency powered reactive magnetron sputtering with different bias voltages. The influence of sputtering bias on the microstructure and properties of Nb-Si-N films was studied. The results reveal that as the bias voltage increases the Nb/Si ratio and the surface roughness increase. The microstructure of Nb-Si-N films is the nano-composite structure with nano-sized NbN grains embedded in amorphous SiNx phase. High sputtering bias is in favor of the growth of NbN grains in the Nb-Si-N films. As the bias increases the ε-NbN phase increases. The sheet resistance and microhardness of Nb-Si-N films also change as the bias varies. This phenomenon may be related with the ε-NbN phase in some degree.

KW - Magnetron sputtering

KW - Microstructure

KW - Nb-Si-N films

KW - Properties

UR - https://www.scopus.com/pages/publications/33846537296

U2 - 10.1016/j.surfcoat.2006.07.082

DO - 10.1016/j.surfcoat.2006.07.082

M3 - 文章

AN - SCOPUS:33846537296

SN - 0257-8972

VL - 201

SP - 4931

EP - 4934

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 9-11 SPEC. ISS.

ER -

Influence of sputtering bias on the microstructure and properties of Nb-Si-N films

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