摘要
The gate oxide interface state of SiC MOSFET is the main factor that affects the high temperature reliability of the device. Therefore, the high temperature reliability test of planar gate depleted 1200V20A SiC MOSFET is carried out in this paper. The relationship between leakage current and temperature is studied by comparing the change process of leakage current and temperature in the initial stage of high temperature gate bias and high temperature reverse bias. After the HTGB and HTRB test, the threshold voltage and on resistance are measured at room temperature. The influence of the HTGB test and HTRB test on device parameters is further analyzed, and the relationship between them is revealed.
| 源语言 | 英语 |
|---|---|
| 期刊论文编号 | 012096 |
| 期刊 | Journal of Physics: Conference Series |
| 卷 | 2033 |
| 期 | 1 |
| DOI | |
| 出版状态 | 已出版 - 5 10月 2021 |
| 活动 | 3rd International Conference on Electrical, Communication and Computer Engineering, ICECCE 2021 - Kuala Lumpur, Virtual, 马来西亚 期限: 12 6月 2021 → 13 6月 2021 |
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