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In situ TEM study on crack propagation in nanoscale Au thin films

  • Hongtao Wang
  • , Anmin Nie
  • , Jiabin Liu
  • , Peng Wang
  • , Wei Yang
  • , Bangdao Chen
  • , Hongzhong Liu
  • , Maosen Fu

科研成果: 期刊稿件文章同行评审

31 引用 (Scopus)

摘要

In situ straining in nanocrystalline Au thin films reveals a new fracture mechanism, i.e. crack propagation by atomic migration. The crack propagates by repetitively nucleating and moving atomic steps from the tip region to the crack rear. The stress concentration at the tip helps in the step nucleation process. The elastic energy density at the notch root decreases with increasing notch angle, which implies cracks with small angles can propagate along grain boundaries more easily.

源语言英语
页(从-至)377-379
页数3
期刊Scripta Materialia
65
5
DOI
出版状态已出版 - 9月 2011

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