@inproceedings{94258731951b4006ba76841b3f4fb1d1,
title = "Heat accumulation effect existing in silicon substrate by femtosecond laser irradiation on antireflection performance",
abstract = "Reducing the reflection of silicon surface is an effective way to enhance its optical absorption performance in optical and optoelectronic devices. In this paper, the influence mechanism of heat accumulation effect existing in the material substrate on the multi-scale porosity properties of surface structure during femtosecond laser irradiation is investigated. Micro-nano structures will lose their multi-scale porous properties at high-repetition-rate laser irradiation due to excessive agglomeration, nucleation or melting. By rapidly cooling the material substrate, the porosity of surface micro-nano structure are optimized, and the antireflection performance of the material surface is improved obviously. Our study opens a novel and convenient route for preparation of broadband antireflective black silicon surfaces for various applications.",
keywords = "broadband antireflection; high-repetition-rate femtosecond laser; porous micro-structures; heat accumulation effect; cooling the silicon substrate",
author = "Tong Chen and Wenjun Wang and Tao Tao and Xuesong Mei and Aifei Pan",
note = "Publisher Copyright: {\textcopyright} 2019 SPIE.; Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems IV 2019 ; Conference date: 12-08-2019",
year = "2019",
doi = "10.1117/12.2528299",
language = "英语",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Matthias Kroedel and Goodman, \{Bill A.\}",
booktitle = "Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems IV",
}