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GSMBE growth and characterization of InxGa1-xAs/InP strained-layer MQWs in a P-i-N configuration

  • Wang Xiaoliang
  • , Sun Dianzhao
  • , Kong Meiying
  • , Hou Xun
  • , Zeng Yiping
  • CAS - Institute of Semiconductors
  • CAS - Xi'an Institute of Optics and Precision Mechanics

科研成果: 期刊稿件文章同行评审

摘要

InxGa1-xAs/InP (0.39 ≤ × ≤ 0.68) strained-layer quantum wells having 20 wells with thickness of 50 Å in a P-i-N configuration were grown by gas source molecular beam epitaxy (GSMBE). High-resolution X-ray diffraction rocking curves show the presence of up to seven orders of sharp and intense satellite reflection, indicative of the structural perfection of the samples. Low-temperature photoluminescence and low-temperature absorption spectra were used to determine the exciton transition energies as a function of strain. Good agreement is achieved between exciton transition energies obtained experimentally at low temperature with those calculated using the deformation potential theory.

源语言英语
页(从-至)1254-1258
页数5
期刊Journal of Crystal Growth
175-176
PART 2
DOI
出版状态已出版 - 5月 1997
已对外发布

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