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Ferromagnetism of magnetically doped topological insulators in CrxBi2-xTe3 thin films

  • Y. Ni
  • , Z. Zhang
  • , I. C. Nlebedim
  • , R. L. Hadimani
  • , G. Tuttle
  • , D. C. Jiles
  • Iowa State University
  • United States Department of Energy

科研成果: 期刊稿件文章同行评审

18 引用 (Scopus)

摘要

We investigated the effect of magnetic doping on magnetic and transport properties of Bi2Te3 thin films. CrxBi2-xTe3 thin films with x = 0.03, 0.14, and 0.29 were grown epitaxially on mica substrate with low surface roughness (∼0.4 nm). It is found that Cr is an electron acceptor in Bi2Te3 and increases the magnetization of CrxBi2-xTe3. When x = 0.14 and 0.29, ferromagnetism appears in CrxBi2-xTe3 thin films, where anomalous Hall effect and weak localization of magnetoconductance were observed. The Curie temperature, coercivity, and remnant Hall resistance of thin films increase with increasing Cr concentration. The Arrott-Noakes plot demonstrates that the critical mechanism of the ferromagnetism can be described better with 3D-Heisenberg model than with mean field model. Our work may benefit for the practical applications of magnetic topological insulators in spintronics and magnetoelectric devices.

源语言英语
文章编号17C748
期刊Journal of Applied Physics
117
17
DOI
出版状态已出版 - 7 5月 2015
已对外发布

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