Extreme ultraviolet source development: A comparison of different concepts

G. Schriever; M. Rahe; U. Rebhan; D. Basting; W. J. Walecki; H. Lauth; R. Lebert; K. Bergmann; D. Hoffmann; O. Rosier; W. Neff; R. Poprawe; R. Sauerbrey; H. Schwoerer; S. Düesterer; D. Ziener; P. Nickles; H. Stiehl; I. Will; W. Sandner; G. Schmahl; D. Rudolph

doi:10.1117/12.406662

Extreme ultraviolet source development: A comparison of different concepts

G. Schriever
, M. Rahe
, U. Rebhan
, D. Basting
, W. J. Walecki
, H. Lauth
, R. Lebert
, K. Bergmann
, D. Hoffmann
, O. Rosier
, W. Neff
, R. Poprawe
, R. Sauerbrey
, H. Schwoerer
, S. Düesterer
, D. Ziener
, P. Nickles
, H. Stiehl
, I. Will
, W. Sandner

G. Schmahl, D. Rudolph

Coherent Inc.
Jenoptik AG
Fraunhofer Institute for Laser Technology
Friedrich Schiller University Jena
Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy
Gustav August Universität Güttingen

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17 引用（Scopus）

摘要

We discuss the results of the studies of Z-pinch sources for photolithographic applications developed by Lambda Physik. We also report the results of fundamental investigations pursued by Fraunhofer-Institut fuer Lasertechnik, Friedrich-Schiller Universitaet Jena, Max-Born Institut Berlin, and Gustav August Universitaet Goettingen. The later efforts are supported by German government and steered by the industrial consortium led by Lambda Physik.

源语言	英语
页（从-至）	113-120
页数	8
期刊	Proceedings of SPIE - The International Society for Optical Engineering
卷	4146
期	1
DOI	https://doi.org/10.1117/12.406662
出版状态	已出版 - 8 11月 2000
已对外发布	是

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Schriever, G., Rahe, M., Rebhan, U., Basting, D., Walecki, W. J., Lauth, H., Lebert, R., Bergmann, K., Hoffmann, D., Rosier, O., Neff, W., Poprawe, R., Sauerbrey, R., Schwoerer, H., Düesterer, S., Ziener, D., Nickles, P., Stiehl, H., Will, I., ... Rudolph, D. (2000). Extreme ultraviolet source development: A comparison of different concepts. Proceedings of SPIE - The International Society for Optical Engineering, 4146(1), 113-120. https://doi.org/10.1117/12.406662

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title = "Extreme ultraviolet source development: A comparison of different concepts",

abstract = "We discuss the results of the studies of Z-pinch sources for photolithographic applications developed by Lambda Physik. We also report the results of fundamental investigations pursued by Fraunhofer-Institut fuer Lasertechnik, Friedrich-Schiller Universitaet Jena, Max-Born Institut Berlin, and Gustav August Universitaet Goettingen. The later efforts are supported by German government and steered by the industrial consortium led by Lambda Physik.",

keywords = "EUV source, Extreme ultraviolet, Gas discharge source, Laser produced plasma, Z-pinch",

author = "G. Schriever and M. Rahe and U. Rebhan and D. Basting and Walecki, \{W. J.\} and H. Lauth and R. Lebert and K. Bergmann and D. Hoffmann and O. Rosier and W. Neff and R. Poprawe and R. Sauerbrey and H. Schwoerer and S. D{\"u}esterer and D. Ziener and P. Nickles and H. Stiehl and I. Will and W. Sandner and G. Schmahl and D. Rudolph",

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Schriever, G, Rahe, M, Rebhan, U, Basting, D, Walecki, WJ, Lauth, H, Lebert, R, Bergmann, K, Hoffmann, D, Rosier, O, Neff, W, Poprawe, R, Sauerbrey, R, Schwoerer, H, Düesterer, S, Ziener, D, Nickles, P, Stiehl, H, Will, I, Sandner, W, Schmahl, G & Rudolph, D 2000, 'Extreme ultraviolet source development: A comparison of different concepts', Proceedings of SPIE - The International Society for Optical Engineering, 卷 4146, 号码 1, 页码 113-120. https://doi.org/10.1117/12.406662

TY - JOUR

T1 - Extreme ultraviolet source development

T2 - A comparison of different concepts

AU - Schriever, G.

AU - Rahe, M.

AU - Rebhan, U.

AU - Basting, D.

AU - Walecki, W. J.

AU - Lauth, H.

AU - Lebert, R.

AU - Bergmann, K.

AU - Hoffmann, D.

AU - Rosier, O.

AU - Neff, W.

AU - Poprawe, R.

AU - Sauerbrey, R.

AU - Schwoerer, H.

AU - Düesterer, S.

AU - Ziener, D.

AU - Nickles, P.

AU - Stiehl, H.

AU - Will, I.

AU - Sandner, W.

AU - Schmahl, G.

AU - Rudolph, D.

PY - 2000/11/8

Y1 - 2000/11/8

N2 - We discuss the results of the studies of Z-pinch sources for photolithographic applications developed by Lambda Physik. We also report the results of fundamental investigations pursued by Fraunhofer-Institut fuer Lasertechnik, Friedrich-Schiller Universitaet Jena, Max-Born Institut Berlin, and Gustav August Universitaet Goettingen. The later efforts are supported by German government and steered by the industrial consortium led by Lambda Physik.

AB - We discuss the results of the studies of Z-pinch sources for photolithographic applications developed by Lambda Physik. We also report the results of fundamental investigations pursued by Fraunhofer-Institut fuer Lasertechnik, Friedrich-Schiller Universitaet Jena, Max-Born Institut Berlin, and Gustav August Universitaet Goettingen. The later efforts are supported by German government and steered by the industrial consortium led by Lambda Physik.

KW - EUV source

KW - Extreme ultraviolet

KW - Gas discharge source

KW - Laser produced plasma

KW - Z-pinch

UR - https://www.scopus.com/pages/publications/0000125683

U2 - 10.1117/12.406662

DO - 10.1117/12.406662

M3 - 文章

AN - SCOPUS:0000125683

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VL - 4146

SP - 113

EP - 120

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

IS - 1

ER -

Extreme ultraviolet source development: A comparison of different concepts

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