TY - JOUR
T1 - Experimental study on the preparation of superalloy Inconel718 heat exchanger channels by electrochemical etching method
AU - Zhang, Lianjie
AU - Wang, Jinghan
AU - Li, Wei
AU - Yang, Ping
AU - Ma, Ting
AU - Zeng, Min
AU - Wang, Qiuwang
N1 - Publisher Copyright:
© 2024
PY - 2024/8
Y1 - 2024/8
N2 - The nuclear energy field requires the construction of heat exchangers that can withstand sufficiently high temperatures. In this paper, the etching technique was utilized to fabricate heat exchange channels on Inconel718 plates, and experiments were carried out in NaCl-ethylene glycol solution, three temperature conditions of 35 °C, 40 °C, and 45 °C, and two concentrations of electrolyte solutions, 0.5 mol/L and 1 mol/L, with the addition of 50 kHz ultrasound for comparison. The experimental results show that the etching rate can be as high as 2.894 mm/h, and the inter-electrode current is as high as 908 mA. The roughness characterization of the etching channel Ra and Rq measured by the aspheric surface measuring instrument can be as low as 2.416 μm and 2.647 μm, respectively. In the images generated by SEM scanning, it is found that uneven distribution of pits and bumps exist in the etching channel, but their diameters are all less than 0.1 μm, which means the etched channel is acceptably smooth.
AB - The nuclear energy field requires the construction of heat exchangers that can withstand sufficiently high temperatures. In this paper, the etching technique was utilized to fabricate heat exchange channels on Inconel718 plates, and experiments were carried out in NaCl-ethylene glycol solution, three temperature conditions of 35 °C, 40 °C, and 45 °C, and two concentrations of electrolyte solutions, 0.5 mol/L and 1 mol/L, with the addition of 50 kHz ultrasound for comparison. The experimental results show that the etching rate can be as high as 2.894 mm/h, and the inter-electrode current is as high as 908 mA. The roughness characterization of the etching channel Ra and Rq measured by the aspheric surface measuring instrument can be as low as 2.416 μm and 2.647 μm, respectively. In the images generated by SEM scanning, it is found that uneven distribution of pits and bumps exist in the etching channel, but their diameters are all less than 0.1 μm, which means the etched channel is acceptably smooth.
KW - Electrochemical etching
KW - Heat exchanger channel
KW - Inconel718
KW - Surface roughness
KW - Ultrasonic enhancing
UR - https://www.scopus.com/pages/publications/85197311969
U2 - 10.1016/j.tsep.2024.102719
DO - 10.1016/j.tsep.2024.102719
M3 - 文章
AN - SCOPUS:85197311969
SN - 2451-9049
VL - 53
JO - Thermal Science and Engineering Progress
JF - Thermal Science and Engineering Progress
M1 - 102719
ER -