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Epitaxial Systems Combining Oxides and Semiconductors

  • Gang Niu
  • , Guillaume Saint-Girons
  • , Bertrand Vilquin

科研成果: 书/报告/会议事项章节章节同行评审

11 引用 (Scopus)

摘要

Oxides form a class of material, which covers almost all the spectra of functionalities: dielectric, semiconductor, metallic, superconductor, optically nonlinear, piezoelectric, ferroelectric, ferromagnetic, etc. In this chapter, the integration of epitaxial crystalline oxides on the workhorse of the semiconductor industry, the silicon, by molecular beam epitaxy (MBE) is introduced. This chapter reviews the key factors for the epitaxy of oxide crystal on semiconductor as well as the nucleation and growth of semiconductor on oxide substrate. A state of the art for epitaxial systems combining oxides and semiconductors is then given. Finally, a comparison between different complex oxide growth techniques and a description of devices for nanoelectronics combining semiconductors and oxides are presented.

源语言英语
主期刊名Molecular Beam Epitaxy
主期刊副标题from Research to Mass Production
出版商Elsevier
377-402
页数26
ISBN(电子版)9780128121368
ISBN(印刷版)9780128121375
DOI
出版状态已出版 - 1 1月 2018

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