Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer

Yu Fan; Chunhui Wang; Jiaxing Sun; Xiaogang Peng; Hongmiao Tian; Xiangming Li; Xiaoliang Chen; Xiaoming Chen; Jinyou Shao

doi:10.1088/2631-7990/acd827

Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer

Yu Fan
, Chunhui Wang
, Jiaxing Sun
, Xiaogang Peng
, Hongmiao Tian
, Xiangming Li
, Xiaoliang Chen
, Xiaoming Chen
, Jinyou Shao

机械工程学院

Xi'an Jiaotong University

科研成果: 期刊稿件 › 文章 › 同行评审

34 引用（Scopus）

摘要

Highlights Electric-field flexible-roller nanoimprint lithography (EF-NIL) is proposed for nanopatterning. Large-scale nanopatterning is prepared on the stress-sensitive warped substrate. The high-fidelity structures with different varieties and aspect ratios can be fabricated.

源语言	英语
期刊论文编号	035101
期刊	International Journal of Extreme Manufacturing
卷	5
期	3
DOI	https://doi.org/10.1088/2631-7990/acd827
出版状态	已出版 - 9月 2023

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10.1088/2631-7990/acd827

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@article{4e16950bc1c74b3bac1d0334c614d7fa,

title = "Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer",

abstract = "Highlights Electric-field flexible-roller nanoimprint lithography (EF-NIL) is proposed for nanopatterning. Large-scale nanopatterning is prepared on the stress-sensitive warped substrate. The high-fidelity structures with different varieties and aspect ratios can be fabricated.",

keywords = "electric-driven, flexible-roller, nanoimprinting, stress-sensitive, warped",

author = "Yu Fan and Chunhui Wang and Jiaxing Sun and Xiaogang Peng and Hongmiao Tian and Xiangming Li and Xiaoliang Chen and Xiaoming Chen and Jinyou Shao",

note = "Publisher Copyright: {\textcopyright} 2023 The Author(s). Published by IOP Publishing Ltd on behalf of the IMMT.",

year = "2023",

month = sep,

doi = "10.1088/2631-7990/acd827",

language = "英语",

volume = "5",

journal = "International Journal of Extreme Manufacturing",

issn = "2631-8644",

publisher = "IOP Publishing Ltd.",

number = "3",

}

TY - JOUR

T1 - Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer

AU - Fan, Yu

AU - Wang, Chunhui

AU - Sun, Jiaxing

AU - Peng, Xiaogang

AU - Tian, Hongmiao

AU - Li, Xiangming

AU - Chen, Xiaoliang

AU - Chen, Xiaoming

AU - Shao, Jinyou

PY - 2023/9

Y1 - 2023/9

N2 - Highlights Electric-field flexible-roller nanoimprint lithography (EF-NIL) is proposed for nanopatterning. Large-scale nanopatterning is prepared on the stress-sensitive warped substrate. The high-fidelity structures with different varieties and aspect ratios can be fabricated.

AB - Highlights Electric-field flexible-roller nanoimprint lithography (EF-NIL) is proposed for nanopatterning. Large-scale nanopatterning is prepared on the stress-sensitive warped substrate. The high-fidelity structures with different varieties and aspect ratios can be fabricated.

KW - electric-driven

KW - flexible-roller

KW - nanoimprinting

KW - stress-sensitive

KW - warped

UR - https://www.scopus.com/pages/publications/85161710638

U2 - 10.1088/2631-7990/acd827

DO - 10.1088/2631-7990/acd827

M3 - 文章

AN - SCOPUS:85161710638

SN - 2631-8644

VL - 5

JO - International Journal of Extreme Manufacturing

JF - International Journal of Extreme Manufacturing

IS - 3

M1 - 035101

ER -

Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer

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