TY - JOUR
T1 - Effects of Optical Pulse Parameters on a Pulsed UV-Illuminated Switch and Their Adjusting Methods
AU - Li, Junna
AU - Chen, Weiqing
AU - Chen, Zhiqiang
AU - Tang, Junping
AU - Jia, Wei
AU - Guo, Fan
AU - Yang, Tian
AU - Qiu, Aici
AU - Zhao, Junping
AU - Zhang, Qiaogen
N1 - Publisher Copyright:
© 2015 IEEE.
PY - 2015/9/1
Y1 - 2015/9/1
N2 - Ultraviolet (UV) illumination can effectively shorten the statistical lag and jitter in gas breakdown processes. The spark gap discharge can produce abundant spectrum including UV waveband. In this paper, a simple but reliable spark gap operating with N2 at atmospheric pressure is used to test optical radiation characteristics, such as spectrum intensity, rise time, fall time, and duration of optical pulse, which are adjusted by changing the circuit or configuration parameters. Three UV-illuminated switches with different UV spark gap configurations have been tested. The experimental results approve our assumption. With a uniform electric field UV spark gap, the breakdown voltage standard deviation percentage of the switch is 0.74%.
AB - Ultraviolet (UV) illumination can effectively shorten the statistical lag and jitter in gas breakdown processes. The spark gap discharge can produce abundant spectrum including UV waveband. In this paper, a simple but reliable spark gap operating with N2 at atmospheric pressure is used to test optical radiation characteristics, such as spectrum intensity, rise time, fall time, and duration of optical pulse, which are adjusted by changing the circuit or configuration parameters. Three UV-illuminated switches with different UV spark gap configurations have been tested. The experimental results approve our assumption. With a uniform electric field UV spark gap, the breakdown voltage standard deviation percentage of the switch is 0.74%.
KW - Breakdown characteristics
KW - jitter
KW - optical pulse parameter
KW - pulsed power technology
KW - pulsed switch
KW - ultraviolet (UV) illumination
UR - https://www.scopus.com/pages/publications/84957845962
U2 - 10.1109/TPS.2015.2457955
DO - 10.1109/TPS.2015.2457955
M3 - 文章
AN - SCOPUS:84957845962
SN - 0093-3813
VL - 43
SP - 3293
EP - 3297
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
IS - 9
M1 - 7177097
ER -