摘要
The performance of new type three dimensional buried-in electrode structure ultraviolet photodetector fabricated on single crystal diamond epitaxial layer was investigated. The epitaxial layer was grown on high-pressure-higherature Ib-type diamond substrate. Then the buried-in electrodes with different depths were formed by oxygen plasma reactive ion etching method and radio frequency magnetron sputtering technique on this diamond layer. Compared with that of traditional planar electrode photodetector, the responsivity of buried-in electrode photodetector shows higher value, which reaches the highest when the electrode depth is 100 nm.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 1099-1104 |
| 页数 | 6 |
| 期刊 | MRS Advances |
| 卷 | 1 |
| 期 | 16 |
| DOI | |
| 出版状态 | 已出版 - 2016 |
学术指纹
探究 'Effect of depth of Buried-In Tungsten Electrodes on Single Crystal Diamond Photodetector' 的科研主题。它们共同构成独一无二的指纹。引用此
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