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Effect of annealing temperature on ferroelectric electron emission of sol-gel PZT films

  • Muhammad Yaseen
  • , Xiaofeng Chen
  • , Wei Ren
  • , Yujun Feng
  • , Peng Shi
  • , Xiaoqing Wu
  • , Weiguang Zhu
  • Xi'an Jiaotong University
  • Nanyang Technological University

科研成果: 期刊稿件文章同行评审

16 引用 (Scopus)

摘要

In this work, the influence of annealing temperature on the ferroelectric electron emission behaviors of 1.3-μm-thick sol-gel PbZr 0.52Ti0.48O3 (PZT) thin film emitters was investigated. The results revealed that the PZT films were crack-free in perovskite structure with columnar-like grains. Increasing annealing temperature led to the growth of the grains with improved ferroelectric and dielectric properties. The remnant polarization increased slightly from 35.3 to 39.6 μC/cm2 and the coercive field decreased from the 56.4 to 54.6 kV/cm with increasing annealing temperature from 600 to 700 °C. The PZT film emitters exhibited remarkable ferroelectric electron emission behaviors at the threshold voltage above 95 V. The film annealed at 700 °C showed a relatively lower threshold voltage and higher emission current, which is related to the improved ferroelectric and dielectric properties at higher annealing temperature. The highest emission current achieved in this work was around 25 mA at the trigger voltage of 160 V.

源语言英语
页(从-至)S471-S474
期刊Ceramics International
39
SUPPL.1
DOI
出版状态已出版 - 5月 2013

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