跳到主要导航 跳到搜索 跳到主要内容

Development of microelectromechanical varactors

  • C. H. Lee
  • , S. H. Tsai
  • , C. H. Lin
  • , R. Maeda
  • , J. J. Tsaur
  • , K. J. Fang
  • , J. M. Lu
  • , C. Lee
  • , W. Fang

科研成果: 期刊稿件文章同行评审

摘要

A varactor with a wide tuning range is essential to adjust the desired frequency band among a wide Gigahertz range and compensate for process deviation as well as effects of temperature. Nowadays, conventional varactors with high quality cannot be available in standard silicon processes; furthermore, they cannot avoid high losses at high frequencies due to the nature of semiconductors. A novel micromachined varactor with a wide tuning range is presented. It can provide a digital selection of capacitance. The electroplating process was singled out to fabricate such a device, with its feature of high aspect ratio. The design has been verified through a finite-element analysis to show a tuning range of 350%.

源语言英语
页(从-至)486-493
页数8
期刊Proceedings of SPIE - The International Society for Optical Engineering
4408
DOI
出版状态已出版 - 2001
已对外发布

学术指纹

探究 'Development of microelectromechanical varactors' 的科研主题。它们共同构成独一无二的指纹。

引用此