Deposition of thin films by uv light laser ablation

A new method for the preparation of functional thin films using an excimer laser with uv light is presented. Target materials are expected to be removed by photochemical ablation with uv laser radiation rather than by thermal evaporation, which reduces the difference in chemical composition between target material and deposited layer. For Pb(Zr,Ti)O₃ thin films, the influence of deposition and annealing temperature on crystallographic structure and Perovskite phase was investigated. For boron nitride (BN), the effect of ion bombardment was investigated. and cubic BN structure was detected by FTIR spectroscopy.