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Defect and microstructure engineering via Ta/Zn Co-doping for wide temperature range BaTiO3-Bi0.5Na0.5NbO3 dielectric

  • Xi'an Jiaotong University

科研成果: 期刊稿件文章同行评审

1 引用 (Scopus)

摘要

The development of lead-free dielectric ceramics allowing the reliable operation above 150 °C is critical for advanced electronics. The BaTiO3-Bi0.5Na0.5TiO3 (BT-BNT) system is a promising candidate, nonetheless its temperature stability requires further enhancement. This work demonstrates that the synergistic co-doping of Ta5 + and Zn2+ is an effective strategy to achieve this goal. The 0.90 BaTiO3-0.10 Bi0.5Na0.5TiO3-1.5 mol% Ta2O5 ceramic system was fabricated via solid-state reaction, and the effects of ZnO content (0–4.0 wt%) and sintering temperature (1175–1225 °C) were systematically investigated. The optimal composition with 2.0 wt% ZnO sintered at 1200 °C exhibits a high dielectric constant of ∼4415 and an excellent temperature stability, with a capacitance variation (ΔC/C25°C) within ±15% over a broad temperature range of −45 °C to 240 °C. Comprehensive microstructural and chemical analysis were conducted, including XRD, SEM TEM, EDS, XPS, Raman spectra, and high-temperature impedance spectroscopy. The results reveal that ZnO doping plays a multifunctional role. It promotes grain growth and enhances relaxor behavior through the formation of polar nanoregions. Crucially, Zn2+ incorporation tailors the defect chemistry, leading to the formation of a resistive grain boundary layer enriched with A-site vacancies, which is identified as the key mechanism for suppressing conduction loss, enhancing dielectric constant and achieving high thermal stability. However, exceeding the solid solubility limit of ZnO (>2.0 wt%) causes the precipitation of secondary phases, degrading performance. This study highlights the precise defect engineering via co-doping as a vital pathway for developing high-performance, temperature-stable multi-layer ceramic capacitors.

源语言英语
文章编号187266
期刊Journal of Alloys and Compounds
1060
DOI
出版状态已出版 - 31 3月 2026

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