跳到主要导航 跳到搜索 跳到主要内容

Correction: Interface-engineered reliable HfO2-based RRAM for synaptic simulation (Journal of Materials Chemistry C (2019) DOI: 10.1039/c9tc04880d)

  • Xi'an Jiaotong University
  • CAS - Shanghai Institute of Microsystem and Information Technology
  • University of California at Los Angeles
  • Simon Fraser University
  • Innovations for High Performance Microelectronics
  • CAS - Shanghai Institute of Technical Physics

科研成果: 期刊稿件评论/辩论

1 引用 (Scopus)

摘要

There was an error in the author list of this published article. The corresponding authors for this paper are Gang Niu (gangniu@xjtu.edu.cn) and Wei Ren (wren@mail.xjtu.edu.cn). The footnote indicating that Qiang Wang and Gang Niu contributed equally to the work was not intended. The corrected author list and notations are shown here. The Royal Society of Chemistry apologises for these errors and any consequent inconvenience to authors and readers.

源语言英语
页(从-至)13307
页数1
期刊Journal of Materials Chemistry C
7
42
DOI
出版状态已出版 - 2019

学术指纹

探究 'Correction: Interface-engineered reliable HfO2-based RRAM for synaptic simulation (Journal of Materials Chemistry C (2019) DOI: 10.1039/c9tc04880d)' 的科研主题。它们共同构成独一无二的学术指纹。

引用此