Annealing hardening/softening of nanocrystalline Ta films mediated by grain boundary evolution and phase transformation

Due to its service background, the thermal behavior of Ta films is substantially concerning to researchers, especially the heat-induced β-Ta to α-Ta phase transformation. In this work, the nanocrystalline Ta films with varying β/α phase ratios (0.85–0) were deposited and vacuum annealed at 200–800 °C to study the phase transformation behavior and mechanical properties. Partial phase transformation of β-Ta to α-Ta occurred at low temperature (200 °C) and complete transformation when the annealing temperature was raised to 800 °C. Moreover, an orientation relationship of β-<110>//α-<111> and β-{330}//α-{110} was concluded, and a hypothesis theory about the low-temperature phase transformation was proposed. Annealing hardening took place at 200–600 °C and softening at 800 °C in all the samples. The hardening is mostly due to the ordering of intergranular amorphous phases with the temperature increased, simultaneously bringing the increase of modulus. The annealing softening is governed by both grain coarsening and phase transformation, where the latter is dominated in high β fraction samples.